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Patent Quality Metrics for Fiscal Year 2017 and Request for Comments on Improving Patent Quality Measurement

The United States Patent and Trademark Office (USPTO) is revising its patent quality metrics to better identify quality-related issues and more clearly communicate its quality m...

The United States Patent and Trademark Office (USPTO) is revising its patent quality metrics to better identify quality-related issues and more clearly communicate its quality measurements to the public. The new patent quality metrics are part of the USPTO's Enhanced Patent Quality Initiative (EPQI), which was launched in 2015 to engage patent stakeholders in enhancing patent quality. As part of the Enhanced Patent Quality Initiative, the prior patent quality metrics have been reassessed, and new patent quality metrics are now being designed for adoption for fiscal year 2017. The new patent quality metrics for use in fiscal year 2017 are planned to focus on the correctness and clarity of Office actions and will be applied through a newly unified review process using a standardized review form that will permit data from a significantly larger number of finished product quality reviews conducted at the agency to be aggregated and mined for information. The USPTO will also mine data on transactions during patent prosecution (e.g., the types of actions taken by the applicant and the USPTO) to assess examination processes and identify potential quality issues requiring further study. The review process will apply the new quality metrics and standardized form to increase the accuracy, consistency, transparency, clarity, and simplicity of USPTO quality review procedures. The USPTO is seeking comment from its stakeholders on further improvements to the changes proposed herein.

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81 FR 16142

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“Patent Quality Metrics for Fiscal Year 2017 and Request for Comments on Improving Patent Quality Measurement,” thefederalregister.org (March 25, 2016), https://thefederalregister.org/documents/2016-06851/patent-quality-metrics-for-fiscal-year-2017-and-request-for-comments-on-improving-patent-quality-measurement.