80 FR 12934 - Mandatory Greenhouse Gas Reporting
ENVIRONMENTAL PROTECTION AGENCY Federal Register Volume 80, Issue 48 (March 12, 2015)
Federal Register Volume 80, Issue 48 (March 12, 2015)
| Page Range | 12934-12935 | |
| FR Document | 2015-05549 |
[Federal Register Volume 80, Number 48 (Thursday, March 12, 2015)] [Rules and Regulations] [Pages 12934-12935] From the Federal Register Online [www.thefederalregister.org] [FR Doc No: 2015-05549] ======================================================================= ----------------------------------------------------------------------- ENVIRONMENTAL PROTECTION AGENCY 40 CFR Part 98 Mandatory Greenhouse Gas Reporting CFR Correction In Title 40 of the Code of Federal Regulations, Parts 96 to 99, revised as of July 1, 2014, on pages 696 through 698, in subpart I of part 98, tables I-5 through I-7 are corrected to read as follows: Table I-5 To Subpart I of Part 98--Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for MEMS Manufacturing -------------------------------------------------------------------------------------------------------------------------------------------------------- Process gas i ----------------------------------------------------------------------------------------------------------- Process type factors NF3 CF4 C2F6 CHF3 CH2F2 C3F8 c- C4F8 Remote NF3 SF6 C4F6a C5F8a C4F8Oa -------------------------------------------------------------------------------------------------------------------------------------------------------- Etch 1-Ui................................... 0.7 10.4 10.4 10.06 NA 10.2 NA 0.2 0.2 0.1 0.2 NA Etch BCF4................................... NA 10.4 10.07 10.08 NA 0.2 NA NA NA 10.3 0.2 NA Etch BC2F6.................................. NA NA NA NA NA 0.2 NA NA NA 10.2 0.2 NA CVD Chamber Cleaning 1-Ui................... 0.9 0.6 NA NA 0.4 0.1 0.02 0.2 NA NA 0.1 0.1 CVD Chamber Cleaning BCF4................... NA 0.1 NA NA 0.1 0.1 20.02 20.1 NA NA 0.1 0.1 CVD Chamber Cleaning BC3F8.................. NA NA NA NA NA NA NA NA NA NA NA 0.4 -------------------------------------------------------------------------------------------------------------------------------------------------------- Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type. \1\ Estimate includes multi-gas etch processes. \2\ Estimate reflects presence of low-k, carbide and multi-gas etch processes that may contain a C-containing fluorinated GHG additive. Table I-6 To Subpart I of Part 98--Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By- Product Formation Rates (Bijk) for LCD Manufacturing ---------------------------------------------------------------------------------------------------------------- Process gas i -------------------------------------------------------------------------------- Process type factors NF3 CF4 C2F6 CHF3 CH2F2 C3F8 c- C4F8 Remote NF3 SF6 ---------------------------------------------------------------------------------------------------------------- Etch 1-Ui...................... 0.6 NA 0.2 NA NA 0.1 NA NA 0.3 Etch BCF4...................... NA NA 0.07 NA NA 0.009 NA NA NA Etch BCHF3..................... NA NA NA NA NA 0.02 NA NA NA Etch BC2F4..................... NA NA 0.05 NA NA NA NA NA NA CVD Chamber Cleaning 1-Ui...... NA NA NA NA NA NA 0.03 0.3 0.9 ---------------------------------------------------------------------------------------------------------------- Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub- type or process type. Table I-7 To Subpart I of Part 98--Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By- Product Formation Rates (Bijk) for PV Manufacturing ---------------------------------------------------------------------------------------------------------------- Process gas i -------------------------------------------------------------------------------- Process type factors NF3 CF4 C2F6 CHF3 CH2F2 C3F8 c- C4F8 Remote NF3 SF6 ---------------------------------------------------------------------------------------------------------------- Etch 1-Ui...................... 0.7 0.4 0.4 NA NA 0.2 NA NA 0.4 Etch BCF4...................... NA 0.2 NA NA NA 0.1 NA NA NA Etch BC2F6..................... NA NA NA NA NA 0.1 NA NA NA CVD Chamber Cleaning 1-Ui...... NA 0.6 NA NA 0.1 0.1 NA 0.3 0.4 [[Page 12935]] CVD Chamber Cleaning BCF4...... NA 0.2 NA NA 0.2 0.1 NA NA NA ---------------------------------------------------------------------------------------------------------------- Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub- type or process type. [FR Doc. 2015-05549 Filed 3-11-15; 8:45 am] BILLING CODE 1505-01-D
![12934 Federal Register / Vol. 80, No. 48 / Thursday, March 12, 2015 / Rules and Regulations
BNSF Swing Bridge, mile 105.6, and tow vessels to recreational pleasure Dated: March 5, 2015.
provides 39 feet of vertical clearance craft including cabin cruisers and Steven M. Fischer,
above Columbia River Datum 0.0 while sailing vessels. The bridge can be Bridge Administrator, Thirteenth Coast Guard
in the closed position. Vessels able to opened for emergency vessels in District.
pass through the bridge in the closed response to a call, however, if an [FR Doc. 2015–05628 Filed 3–11–15; 8:45 am]
positions may do so at anytime. The opening for emergencies is needed, an BILLING CODE 9110–04–P
current operating schedule for the extension of this deviation will be
bridge is set out in 33 CFR 117.5. The required to complete the work. No
normal operating schedule for the BNSF immediate alternate route for vessels to
pass is available on this part of the river. ENVIRONMENTAL PROTECTION
Swing Bridge states that the bridge must
The Coast Guard will also inform the AGENCY
open promptly and fully on request.
users of the waterways through our
This deviation allows the swing span of Local and Broadcast Notices to Mariners 40 CFR Part 98
the BNSF Railway Bridge across the of the change in operating schedule for
Columbia River, mile 105.6, to remain the bridge so that vessels can arrange Mandatory Greenhouse Gas Reporting
in the closed-to-navigation position, and their transits to minimize any impact
need not open for maritime traffic from CFR Correction
caused by the temporary deviation.
5 p.m. on April 27, 2015 until 9 a.m. on In accordance with 33 CFR 117.35(e), In Title 40 of the Code of Federal
April 28, 2015. The bridge shall operate the drawbridge must return to its regular Regulations, Parts 96 to 99, revised as of
in accordance to 33 CFR 117.5 at all operating schedule immediately at the July 1, 2014, on pages 696 through 698,
other times. Waterway usage on this end of the designated time period. This in subpart I of part 98, tables I–5
part of the Columbia River includes deviation from the operating regulations through I–7 are corrected to read as
vessels ranging from commercial tug is authorized under 33 CFR 117.35. follows:
TABLE I–5 TO SUBPART I OF PART 98—DEFAULT EMISSION FACTORS (1–Uij) FOR GAS UTILIZATION RATES (Uij) AND BY-
PRODUCT FORMATION RATES (Bijk) FOR MEMS MANUFACTURING
Process gas i
Process type factors NF3
c¥
CF4 C2F6 CHF3 CH2F2 C3F8 Re- NF3 SF6 C4F6a C5F8a C4F8Oa
C4F8 mote
Etch 1–Ui ........................................................... 0.7 10.4 10.4 10.06 NA 10.2 NA 0.2 0.2 0.1 0.2 NA
Etch BCF4 ......................................................... NA 10.4 10.07 10.08 NA 0.2 NA NA NA 10.3 0.2 NA
Etch BC2F6 ........................................................ NA NA NA NA NA 0.2 NA NA NA 10.2 0.2 NA
CVD Chamber Cleaning 1–Ui ........................... 0.9 0.6 NA NA 0.4 0.1 0.02 0.2 NA NA 0.1 0.1
CVD Chamber Cleaning BCF4 .......................... NA 0.1 NA NA 0.1 0.1 20.02 20.1 NA NA 0.1 0.1
CVD Chamber Cleaning BC3F8 ........................ NA NA NA NA NA NA NA NA NA NA NA 0.4
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is
not used in or emitted from a particular process sub-type or process type.
1 Estimate includes multi-gas etch processes.
2 Estimate reflects presence of low-k, carbide and multi-gas etch processes that may contain a C-containing fluorinated GHG additive.
TABLE I–6 TO SUBPART I OF PART 98—DEFAULT EMISSION FACTORS (1–Uij) FOR GAS UTILIZATION RATES (Uij) AND BY-
PRODUCT FORMATION RATES (Bijk) FOR LCD MANUFACTURING
Process gas i
Process type factors c¥ NF3
CF4 C2F6 CHF3 CH2F2 C3F8 C4F8 Re- NF3 SF6
mote
Etch 1–Ui .......................................................................... 0.6 NA 0.2 NA NA 0.1 NA NA 0.3
Etch BCF4 ........................................................................ NA NA 0.07 NA NA 0.009 NA NA NA
Etch BCHF3 ...................................................................... NA NA NA NA NA 0.02 NA NA NA
Etch BC2F4 ....................................................................... NA NA 0.05 NA NA NA NA NA NA
CVD Chamber Cleaning 1–Ui .......................................... NA NA NA NA NA NA 0.03 0.3 0.9
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply
that a particular gas is not used in or emitted from a particular process sub-type or process type.
TABLE I–7 TO SUBPART I OF PART 98—DEFAULT EMISSION FACTORS (1–Uij) FOR GAS UTILIZATION RATES (Uij) AND BY-
PRODUCT FORMATION RATES (Bijk) FOR PV MANUFACTURING
Process gas i
rljohnson on DSK3VPTVN1PROD with RULES
Process type factors NF3
c¥
CF4 C2F6 CHF3 CH2F2 C3F8 Re- NF3 SF6
C4F8
mote
Etch 1–Ui .......................................................................... 0.7 0.4 0.4 NA NA 0.2 NA NA 0.4
Etch BCF4 ........................................................................ NA 0.2 NA NA NA 0.1 NA NA NA
Etch BC2F6 ....................................................................... NA NA NA NA NA 0.1 NA NA NA
CVD Chamber Cleaning 1–Ui .......................................... NA 0.6 NA NA 0.1 0.1 NA 0.3 0.4
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![Federal Register / Vol. 80, No. 48 / Thursday, March 12, 2015 / Rules and Regulations 12935
TABLE I–7 TO SUBPART I OF PART 98—DEFAULT EMISSION FACTORS (1–Uij) FOR GAS UTILIZATION RATES (Uij) AND BY-
PRODUCT FORMATION RATES (Bijk) FOR PV MANUFACTURING—Continued
Process gas i
Process type factors NF3
c¥
CF4 C2F6 CHF3 CH2F2 C3F8 Re- NF3 SF6
C4F8 mote
CVD Chamber Cleaning BCF4 ......................................... NA 0.2 NA NA 0.2 0.1 NA NA NA
Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply
that a particular gas is not used in or emitted from a particular process sub-type or process type.
[FR Doc. 2015–05549 Filed 3–11–15; 8:45 am] 12163, Sept. 29, 1979, 44 FR 56673; and 3 Regulatory Review, NASA is currently
BILLING CODE 1505–01–D
CFR 1979 Comp., p. 435. reviewing and revising the NFS with an
Aman S. Djahanbani, emphasis on streamlining it and
Chief Acquisition Officer. reducing associated burdens. Due to the
volume of the NFS, these revisions are
AGENCY FOR INTERNATIONAL [FR Doc. 2015–05580 Filed 3–11–15; 8:45 am]
being made in increments.
DEVELOPMENT BILLING CODE 6116–01–P
NASA published two proposed rules
48 CFR Parts 709 and 752 as the first two incremental steps to
update and revise the NASA FAR
NATIONAL AERONAUTICS AND Supplement: 78 FR 23199–23203, April
RIN 0412–AA76 SPACE ADMINISTRATION 18, 2013, and 79 FR 57015–57032,
Incorporate Various Administrative 48 CFR Parts 1809, 1815, 1816, 1817, September 24, 2014. Together, these two
Changes and Internal Policies in to the 1829, 1823, 1827, 1828, 1831, 1832, rules proposed regulatory changes to 19
USAID Acquisition Regulation (AIDAR) 1834, 1837, 1841, 1842, 1846, 1849, Parts of the NFS. The two rules also
1851, and 1852 advised the public that no regulatory
AGENCY: U.S. Agency for International changes were being made to an
Development. RIN 2700–AE01 and 2700–AE09 additional 13 NFS Parts.
ACTION: Direct final rule; Corrections. This final rule finalizes these two
NASA Federal Acquisition Regulation
proposed rules.
SUMMARY: The U.S. Agency for Supplement
International Development (USAID) is II. Discussion and Analysis
AGENCY: National Aeronautics and
issuing corrections to FR Doc. 2014– Space Administration (NASA). NASA reviewed the public comments
26051; Incorporate Various in the development of the final rule. A
ACTION: Final rule.
Administrative Changes and Internal discussion of the comments and the
Policies in to the USAID Acquisition SUMMARY: NASA is issuing a final rule changes made to the rule as a result of
Regulation (AIDAR), that was published amending the NASA Federal those comments are provided as
on December 16, 2014 (79 FR 74985). Acquisition Regulation Supplement follows:
DATES: Effective March 16, 2015. (NFS) with the goal of eliminating
unnecessary regulation, streamlining A. Summary of Significant Changes
FOR FURTHER INFORMATION CONTACT:
overly-burdensome regulation, From the Proposed Rule
Lyudmila Bond, Telephone: 202–567–
4753 or Email: lbond@usaid.gov. clarifying language, and simplifying The definitions of ‘‘counterfeit goods’’
processes where possible. and ‘‘legally authorized source’’ at
SUPPLEMENTARY INFORMATION:
DATES: Effective April 13, 2015. 1846.101 are deleted. NASA, in
Corrections FOR FURTHER INFORMATION CONTACT: conjunction with the FAR Council, is
In rule FR Doc. 2014–26051 published Cynthia Boots, NASA, Office of working to develop and implement a
in the Federal Register at 79 FR 74985, Procurement, email: cynthia.d.boots@ definition of counterfeit part in the
December 16, 2015, make the following nasa.gov, or 202–358–1248. Federal Acquisition Regulation, which
corrections: SUPPLEMENTARY INFORMATION: would also address the concept of
‘‘legally authorized sources’’.
§ 709.403 [Corrected] I. Background Consequently, the NFS will not have an
■ 1. On page 74992, in the definitions of The NASA FAR Supplement (NFS) is independent definition of either
‘‘Debarring official’’ and ‘‘Suspending codified at 48 CFR part 1800. ‘‘counterfeit goods’’ or ‘‘legally
Official’’ in § 709.403, correct ‘‘Senior Periodically, NASA performs a authorized source’’. Rather, use of the
Deputy Assistant Administrator, Bureau comprehensive review and analysis of term counterfeit part in the NFS will be
for Management’’ to read ‘‘Assistant the regulation, makes updates and consistent with the FAR definition.
Administrator, Bureau for Management, corrections, and reissues the NASA FAR
B. Analysis of Public Comments
or designee as delegated in Agency Supplement. The last reissue was in
policy found in ADS 103—Delegations 2004. The goal of the review and Comment: In response to proposed
rljohnson on DSK3VPTVN1PROD with RULES
of Authority’’. analysis is to reduce regulatory burden rule #1, NASA received comments from
where justified and appropriate and three respondents. The three
§ 752.7005 [Corrected] make the NFS content and processes respondents suggested that the proposed
On page 75002, § 752.7005(b)(1)(iv), more efficient and effective, faster and definitions of ‘‘counterfeit goods’’ and
remove the second sentence. simpler, in support of NASA’s mission. ‘‘legally authorized source’’ were
Authority: Sec. 621, Pub. L. 87–195, 75 Consistent with Executive Order (E.O.) problematic in that they introduce
Stat. 445, (22 U.S.C. 2381) as amended; E.O. 13563, Improving Regulations and inconsistencies with standard industry
VerDate Sep<11>2014 14:12 Mar 11, 2015 Jkt 235001 PO 00000 Frm 00021 Fmt 4700 Sfmt 4700 E:\FR\FM\12MRR1.SGM 12MRR1](https://thefederalregister.org/doc/80_FR_12982/page/2.svg)
Document Created: 2018-02-21 09:36:13
Document Modified: 2018-02-21 09:36:13
| Category | Regulatory Information | |
| Collection | Federal Register | |
| sudoc Class | AE 2.7: GS 4.107: AE 2.106: | |
| Publisher | Office of the Federal Register, National Archives and Records Administration | |
| Section | Rules and Regulations | |
| FR Citation | 80 FR 12934 |
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